Exposure apparatus and method

Details Exposure apparatus and method Exposure apparatus and method

2006-06-13

2006-06-13

Lee, John R. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492200, C355S053000, C355S055000

Reexamination Certificate

active

07060994

ABSTRACT:
An exposure apparatus includes a projection optical element that includes at least one reflection element and projects light from a reticle that forms a pattern onto an object, and a drive part that moves at least one of the reticle and the reflection element.

REFERENCES:
patent: 6266389 (2001-07-01), Murayama et al.
patent: 6406820 (2002-06-01), Ota
patent: 9-63923 (1997-03-01), None
patent: 9-153444 (1997-06-01), None
patent: 11-186149 (1999-07-01), None
patent: 11-219900 (1999-08-01), None
patent: 2000-91209 (2000-03-01), None
patent: 2000-286189 (2000-10-01), None
International Searching Authority; Japanese Patent Office; “PCT International Search Report”; corresponding to International Application No. PCT/JP03/07699; date of mailing Sep. 30, 2003; (1 page).

Affiliated with

Also associated with

Rating

Exposure apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus and method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3631252