Method of making magnetoresistive head element

Details Method of making magnetoresistive head element Method of making magnetoresistive head element

2006-10-17

2006-10-17

Letscher, George J. (Department: 2653)

Dynamic magnetic information storage or retrieval

Head

Magnetoresistive reproducing head

C029S603010, C029S603150, C029S603160

Reexamination Certificate

active

07123456

ABSTRACT:
A combined stripe of a magnetoresistive (MR) film and domain control stripe layers can be formed below a photoresist film on the surface of a substratum. An insulating base layer is then formed to extend over the surface of the substratum. The insulating base layer is allowed to cover over the photoresist film, the magnetoresistive film and the domain control stripe layers on the substratum. When the photoresist film is removed, the insulating base layer remains on the substratum. The insulating base layer keeps contacting the side surface of the magnetoresistive film. The magnetoresistive film can be kept covered with the insulating base layer at the side surface during a subsequent etching process. Any chemical reaction can be avoided between the magnetoresistive film and the etching gas employed in the etching process. The resulting magnetoresistive head element is allowed to exhibit an ideal characteristic in the magnetoresistive effect.

REFERENCES:
patent: 5314596 (1994-05-01), Shukovsky et al.
patent: 5566075 (1996-10-01), Syouji et al.
patent: 5946168 (1999-08-01), Hashimoto et al.
patent: 5961848 (1999-10-01), Jacquet et al.
patent: 6181532 (2001-01-01), Dovek et al.
patent: 6266218 (2001-07-01), Carey et al.
patent: 6729015 (2004-05-01), Matono et al.
patent: 11-339228 (1999-12-01), None
English Translation of JP 11-339228 (JP Patent No. 2933916), Yoshida et al., Dec. 10, 1999.

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