Optical metrology tool having improved contrast

Details Optical metrology tool having improved contrast Optical metrology tool having improved contrast

2006-05-23

2006-05-23

Font, Frank G. (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

C356S237200, C356S237500, C438S016000

Reexamination Certificate

active

07050162

ABSTRACT:
The subject invention relates to broadband optical metrology tools for performing measurements of patterned thin films on semiconductor integrated circuits. Particularly a family of optical designs for broadband optical systems wherein the ratio of illumination system to collection system numerical apertures is less than 1. System performance is enhanced through selection and control of the optical system partial coherence; this is accomplished through installation of beam-control apertures within the illumination and collection optical systems. The invention is broadly applicable to a large class of broadband optical wafer metrology techniques including spectrophotometry, spectroscopic reflectometry, spectroscopic ellipsometry and spectroscopic scatterometry.

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