Chemical liquid processing apparatus for processing a substrate

Details Chemical liquid processing apparatus for processing a substrate Chemical liquid processing apparatus for processing a substrate

2006-06-27

2006-06-27

Kornakov, M. (Department: 1746)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

For liquid etchant

C156S345110, C156S345510, C134S094100, C134S184000, C134S902000, C015S300100, C015S302000, C015S303000, C015S320000, C015S345000, C015S383000

Reexamination Certificate

active

07067033

ABSTRACT:
In this disclosure, air flow is formed above chemical liquid film and a move of the chemical liquid is generated by making the air flow into a contact with the surface of chemical liquid. Further, a negative pressure is generated in a space between a processing object substrate and a plate by rotating the plate. Consequently, uniformity of processing of chemical liquid is improved, so that liquid removing step can be carried out effectively. As a result, yield rate of chemical liquid treatment can be improved.

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