High f T and f max bipolar transistor and method of making...

Active solid-state devices (e.g. – transistors – solid-state diode – Bipolar transistor structure

Reexamination Certificate

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C257S592000

Reexamination Certificate

active

07038298

ABSTRACT:
A high fTand fmaxbipolar transistor (100) includes an emitter (104), a base (120), and a collector (116). The emitter has a lower portion (108) and an upper portion (112) that extends beyond the lower portion. The base includes an intrinsic base (14) and an extrinsic base (144). The intrinsic base is located between the lower portion of the emitter and the collector. The extrinsic base extends from the lower portion of the emitter beyond the upper portion of the emitter and includes a continuous conductor (148) that extends from underneath the upper portion of the emitter and out from underneath the upper portion of the emitter. The continuous conductor provides a low electrical resistance path from a base contact (not shown) to the intrinsic base. The transistor may include a second conductor (152) that does not extend underneath the upper portion of the emitter, but which further reduces the electrical resistance through the extrinsic base.

REFERENCES:
patent: 4752817 (1988-06-01), Lechaton et al.
patent: 5008207 (1991-04-01), Blouse et al.
patent: 5024957 (1991-06-01), Harame et al.
patent: 5232861 (1993-08-01), Miwa
patent: 5352617 (1994-10-01), Miwa
patent: 5436180 (1995-07-01), de Fresart et al.
patent: 5624856 (1997-04-01), Li et al.
patent: 5962880 (1999-10-01), Oda et al.
patent: 6028345 (2000-02-01), Johnson
patent: 6262472 (2001-07-01), Gregory
patent: 6316818 (2001-11-01), Marty et al.
patent: 6333236 (2001-12-01), Koganei
patent: 6362066 (2002-03-01), Ryum et al.
patent: 2002/0058388 (2002-05-01), Ryum et al.
patent: 2003/0006484 (2003-01-01), Asai et al.
patent: 5175221 (1993-07-01), None
patent: 10223649 (1998-08-01), None
patent: 2001319936 (2000-12-01), None

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