Method and apparatus for the electrochemical deposition and...

Details Method and apparatus for the electrochemical deposition and... Method and apparatus for the electrochemical deposition and...

2006-04-11

2006-04-11

King, Roy (Department: 1742)

Chemistry: electrical and wave energy

Apparatus

Electrolytic

C204S212000, C204S242000, C204S275100, C204S297010, C205S662000, C205S663000, C205S668000, C205S640000, C205S222000, C205S087000

Reexamination Certificate

active

07025860

ABSTRACT:
An apparatus for performing an electrochemical process on a metallic surface of a workpiece, comprised of a substantially incompressible workpiece support plate. A platen for supporting the workpiece support plate, has at least one opening coupled to a source of electrolyte for receiving an electrolyte solution therethrough and placing the electrolyte solution in contact with the support plate and workpiece. A first conductive element is coupled to, a first potential and positioned proximate the metallic surface, and the carrier is configured to position the workpiece proximate the support plate.

REFERENCES:
patent: 5489233 (1996-02-01), Cook et al.
patent: 5911619 (1999-06-01), Uzoh et al.
patent: 6176992 (2001-01-01), Talich
patent: 6251235 (2001-06-01), Talieh et al.
patent: 6328872 (2001-12-01), Talieh et al.
patent: 6802955 (2004-10-01), Emesh et al.
patent: 2003/0127320 (2003-07-01), Emesh et al.

Affiliated with

Also associated with

Rating

Method and apparatus for the electrochemical deposition and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for the electrochemical deposition and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for the electrochemical deposition and... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3618994