Charged particle beam exposure method, charged particle beam...

Details Charged particle beam exposure method, charged particle beam... Charged particle beam exposure method, charged particle beam...

2006-05-23

2006-05-23

Nguyen, Kiet T. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492220, C250S398000

Reexamination Certificate

active

07049610

ABSTRACT:
In a charged particle beam exposure method of applying
ot applying charged particle beams to expose a substrate by deflecting the charged particle beams to move the charged particle beams on a blanking aperture stop, the size of the charged particle beams on the blanking aperture stop is made larger than the size of the blanking aperture stop.

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