Exposure method, exposure apparatus, and method for...

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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Details

C355S072000, C355S075000, C250S492200

Reexamination Certificate

active

07098991

ABSTRACT:
According to one embodiment of the invention, a pattern of a mask is transferred onto a substrate via a projection optical system using an energy beam by placing a substrate on side of an energy beam emitting end portion of projection optical system, when the substrate is exposed, and placing an object on the side of the energy beam emitting end portion of the projection optical system in place of the substrate when the substrate is exchanged. This can adequately remove a light absorptive substance from the region near an output end of the projection optical system and can maintain the gas state even at a time of moving or replacing the substrate.

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patent: 5715064 (1998-02-01), Lin
patent: 5997963 (1999-12-01), Davison et al.
patent: 6757048 (2004-06-01), Arakawa
patent: 2001/0015795 (2001-08-01), Nishi
patent: 2002/0057423 (2002-05-01), Nogawa
patent: 2003/0169407 (2003-09-01), Hasegawa et al.
patent: A 2001-284224 (2001-10-01), None
patent: A 2002-513856 (2002-05-01), None
patent: A 2002-258154 (2002-09-01), None
patent: 2001-0071202 (2001-07-01), None
patent: 429395 (2001-04-01), None
patent: WO 99/57331 (1999-11-01), None

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