Exposure apparatus and method of cleaning optical element of...

Details Exposure apparatus and method of cleaning optical element of... Exposure apparatus and method of cleaning optical element of...

2006-06-13

2006-06-13

Evans, Geoffrey S. (Department: 1725)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S030000, C355S067000, C359S509000, C219S121840

Reexamination Certificate

active

07061576

ABSTRACT:
An exposure apparatus includes a light source, which emits an exposure beam, an optical system including a casing and an optical element, the casing having a closed space and the optical element being disposed in the casing, a first supplier, which supplies an inert gas into the closed space, a second supplier, which supplies one of oxygen and clean air into the closed space and a controller, which changes a wavelength of the exposure beam between exposure of a substrate and cleaning of the optical element.

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