Anti-stiction coating for microelectromechanical devices

Details Anti-stiction coating for microelectromechanical devices Anti-stiction coating for microelectromechanical devices

2006-05-16

2006-05-16

Meeks, Timothy (Department: 1762)

Coating processes

Coating by vapor, gas, or smoke

Base includes an inorganic compound containing silicon or...

C427S255110, C427S255140, C427S255390

Reexamination Certificate

active

07045170

ABSTRACT:
A method for depositing an anti-stiction coating on a MEMS device comprises reacting the vapor of an amino-functionalized silane precursor with a silicon surface of the MEMS device in a vacuum chamber. The method can further comprise cleaning the silicon surface of the MEMS device to form a clean hydroxylated silicon surface prior to reacting the precursor vapor with the silicon surface. The amino-functionalized silane precursor comprises at least one silicon atom, at least one reactive amino (or imine) pendant, and at least one hydrophobic pendant. The amino-functionalized silane precursor is highly reactive with the silicon surface, thereby eliminating the need for a post-process anneal step and enabling the reaction to occur at low pressure. Such vapor-phase deposition of the amino-functionalized silane coating provides a uniform surface morphology and strong adhesion to the silicon surface.

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