Monomer having vinyl group, polymer thereof and photosensitive r

Details Monomer having vinyl group, polymer thereof and photosensitive r Monomer having vinyl group, polymer thereof and photosensitive r

1995-01-31

1997-04-15

Schofer, Joseph L.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Compositions to be polymerized by wave energy wherein said...

522 50, 522154, C08F 248, C08J 320, C08J 328

Patent

active

056210191

ABSTRACT:
The present invention presents a monomer including a vinyl group, which monomer is represented by a general formula (I) wherein R.sub.1 represents one of a hydrogen atom, a tert-butoxycarbonyl group, a tetrahydropyran-2-yl group, a tetrahydrofuran-2-yl group, a 4-methoxytehydropyranyl group, a 1-ethoxyethyl group, a 1-butoxyethyl group and a 1-propoxyethyl group, R.sub.2 represents a hydrocarbon residue including a bridged hydrocarbon group and having a carbon number ranging from 7 to 12 both inclusive, and R.sub.3 represents one of a hydrogen atom and a methyl group. ##STR1##

REFERENCES:
patent: 5217491 (1993-06-01), Vanderbilt
patent: 5304456 (1994-04-01), Ueda et al.
"Applications of Photoinitiators to the Design of Resists for Semiconductor Manufacturing," Hiroshi Ito et al., American Chemical Society, Symp. Ser. vol. 242, 1984, pp. 11-23.
"ArF Excimer Laser Lithography (3)--Evaluation of Resist," Sasago et al., 35th Applied Physics Institution Conference Manuscripts, 1p-K-4, 1989, p. 9.
"Alicyclic Polymer for ArF and KrF Excimer Resist Based on Chemical Amplification," Takechi et al., Journal of Photopolymer Science and Technology, vol. 5, No. 3, 1992, pp. 439-445.
"Challenges in Excimer Laser Lithography for 256M DRAM and Beyond," Endo et al., IEDM Technical Digest, 1992, pp. 45-48.
"Poly(p-tert-butoxycarbonyloxystyrene): a, Convenient Precursor to p-hydroxystyrene Resins," Fr echet et al., Polymer, vol. 24, Aug. 1983, pp. 995-1000.
"A New Preparation of Triarylsulfonium and -selenonium Salts via the Copper (II)-Catalyzed Arylation of Sulfides and Selenides with Diaryliodonium Salts," Crivello et al. J. Org. Chem., vol. 43, No. 15, 1978, pp. 3055-3058.
"Chemically Amplified Resists: a Lithographic Comparison of Acid Generating Species," T. X. Neenan et al., SPIE, vol. 1086, Advances in Resist Technology and Processing VI 1989, pp. 2-10.
"Chemical Amplification Positive Resist Systems Using Novel Sulfonates as Acid Generators," Ueno et al., Procedings of PME '89, 1990, pp. 413-424.
"Raney-Nickel-Isomerisierungen von Bicyclo[2.2.1] heptandiolen," Kurt Heyns et al., Chem. Ber. 105, 1972, pp. 1019-1027.
"Increased Electron Demand in the Solvolysis of Secondary 2-Norbornyl Tosylates," Lambert et al., Journal of the American Chemical Society, vol. 100, 1978, pp. 2501-2505.
"Positive, Chemically Amplified Aromatic Methacrylate Resist Employing the Tetrahydropyranyl Protecting Group," Taylor et al., Chem. Mater., vol. 3(6), 1991, pp. 1031-1040.

Affiliated with

Also associated with

Rating

Monomer having vinyl group, polymer thereof and photosensitive r does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Monomer having vinyl group, polymer thereof and photosensitive r, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Monomer having vinyl group, polymer thereof and photosensitive r will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-361255