Optical error minimization in a semiconductor manufacturing...

Details Optical error minimization in a semiconductor manufacturing... Optical error minimization in a semiconductor manufacturing...

2006-08-29

2006-08-29

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

Detailed holder for original

C355S052000, C355S067000

Reexamination Certificate

active

07098996

ABSTRACT:
Provided are systems and methods for overcoming optical errors occurring from reticle and other hardware usage in a semiconductor fabrication apparatus. The systems and methods minimize optical errors, such as those resulting from gravitational sag on a reticle or mask, for a pattern being projected onto a wafer. The reduced errors allow larger reticles and masks to be used—while maintaining optical accuracy; and also improve optical budget management.

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