Mask pattern forming method and device, and method of...

Details Mask pattern forming method and device, and method of... Mask pattern forming method and device, and method of...

2006-05-02

2006-05-02

Tran, Thang V. (Department: 2651)

Dynamic information storage or retrieval

Binary pulse train information signal

Format arrangement processing for auxiliary information

C369S285000

Reexamination Certificate

active

07038992

ABSTRACT:
A method of forming a mask pattern includes a formatting step for formatting authoring data in accordance with formats of specified media either by a fixed amount at a time or continuously. The authoring data is obtained by an authoring operation in which base information, such as image information or audio information, is edited. The method of forming a mask pattern also includes a mask pattern generating step in which basic pattern information is generated from basic signal pattern data necessary for various types of optical disks as a result of carrying out a pattern editing operation, and the basic pattern information is used to generate a mask pattern by carrying out a mask pattern generating operation. In the steps of a conventional method, it is necessary to carefully determine the conditions which allow disks produced after a plurality of later operations of the method have been carried out to satisfy standards. In addition, it is necessary to carefully observe at all times that these conditions are maintained during the long time required to produce the disks.

REFERENCES:
patent: 4509162 (1985-04-01), Rester
patent: 5238786 (1993-08-01), Kashiwagi
patent: 5881038 (1999-03-01), Oshima et al.
patent: 6252845 (2001-06-01), Hino et al.
patent: 6606294 (2003-08-01), Takemura et al.
patent: 6721254 (2004-04-01), Yamaguchi
patent: 6721264 (2004-04-01), Kutaragi et al.

Affiliated with

Also associated with

Rating

Mask pattern forming method and device, and method of... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Mask pattern forming method and device, and method of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask pattern forming method and device, and method of... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3603513