Exposure apparatus and device manufacturing method

Details Exposure apparatus and device manufacturing method Exposure apparatus and device manufacturing method

2006-09-19

2006-09-19

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S030000

Reexamination Certificate

active

07110088

ABSTRACT:
An exposure apparatus for exposing a substrate to light from a light source via a reticle. The exposure apparatus includes an optical system configured to expose the substrate to light from the light source via the reticle, and has a first optical element, a motor configured to move the first optical element, a first housing accommodating at least the first optical element and the motor, a second housing accommodated in the first housing, accommodating at least a part of the motor, and configured to isolate the part of the motor from the first optical element, a first exhaust system configured to exhaust a first space between the first housing and the second housing, and a second exhaust system configured to exhaust a second space in the second housing.

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patent: 6633364 (2003-10-01), Hayashi
patent: 6707529 (2004-03-01), Aoki et al.
patent: 6961114 (2005-11-01), Murayama et al.
patent: 6-29179 (1994-02-01), None

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