Scatterometry alignment for imprint lithography

Details Scatterometry alignment for imprint lithography Scatterometry alignment for imprint lithography

2006-04-11

2006-04-11

Lee, Hwa (Andrew) (Department: 2877)

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

C356S400000, C430S022000, C430S030000

Reexamination Certificate

active

07027156

ABSTRACT:
Described are methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. Alignment of the template with a previously formed layer on a substrate, in one embodiment, is accomplished by using scatterometry.

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