Mirror holding mechanism in exposure apparatus, and device...

Details Mirror holding mechanism in exposure apparatus, and device... Mirror holding mechanism in exposure apparatus, and device...

2006-01-03

2006-01-03

Epps, Georgia (Department: 2873)

Optical: systems and elements

Lens

With support

C359S818000, C359S872000, C353S100000

Reexamination Certificate

active

06982841

ABSTRACT:
Disclosed is a mirror holding system by which aberration resulting from deformation or positional deviation of an optical member, causing degradation of imaging performance, can be reduced whereby a desired optical performance is assured. Also disclosed is an exposure apparatus and a device manufacturing method based on such mirror holding system. The holding system includes a supporting member for supporting the optical element at a plurality of supports which are movable along an approximately radial direction about a predetermined point.

REFERENCES:
patent: 6631035 (2003-10-01), Iikawa et al.
patent: 3359330 (1993-11-01), None

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