Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1996-01-24
1997-04-15
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429811, C23C 1435
Patent
active
056205775
ABSTRACT:
A rotatable magnetron cathode has one end adapted to be attached to a drive shaft and a free end supported by a yoke suspended from spring-loaded supporting devices attached to a sputtering chamber wall. A dark space shield is attached to the cathode where the cathode connects to the drive shaft of its motor so as to rotate with the cathode. Another dark space shield is attached at the free end of the cathode with an insulator bearing in between such that the cathode can rotate without causing the shield at its front to also rotate. An insulator pad is placed between the yoke and a metal cover piece attached to the shield at the front so as to keep the frontal dark space shield in an electrically floating condition.
REFERENCES:
patent: 4356073 (1982-10-01), McKelvey
patent: 4362611 (1982-12-01), Logan et al.
patent: 4422916 (1983-12-01), McKelvey
patent: 4443318 (1984-04-01), McKelvey
patent: 4445997 (1984-05-01), McKelvey
patent: 4466877 (1984-08-01), McKelvey
patent: 5100527 (1992-03-01), Stevenson et al.
patent: 5108574 (1992-04-01), Kirs et al.
patent: 5200049 (1993-04-01), Stevenson et al.
patent: 5213672 (1993-05-01), Hartig et al.
patent: 5470452 (1995-11-01), Dickey et al.
"Vespel.RTM. Shapes", DuPont Co., Apr. 1990.
M. Wright et al., "Design advances and applications of the rotatable cylindrical magnetron," Journal of Vacuum Science and Technology A. vol. 4, No. 3, May/Jun. 1986, pp. 388-392.
Viratec Thin Films, Inc.
Weisstuch Aaron
LandOfFree
Spring-loaded mount for a rotatable sputtering cathode does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Spring-loaded mount for a rotatable sputtering cathode, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Spring-loaded mount for a rotatable sputtering cathode will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-357980