Stock material or miscellaneous articles – Layer or component removable to expose adhesive
Reexamination Certificate
2006-09-26
2006-09-26
Ahmad, Nasser (Department: 1772)
Stock material or miscellaneous articles
Layer or component removable to expose adhesive
C138S089000, C138S094000, C219S061000, C219S074000, C228S042000, C228S049300, C228S219000, C428S041700, C428S041800, C428S042200, C428S043000, C428S119000, C428S192000, C428S194000
Reexamination Certificate
active
07112358
ABSTRACT:
A self-adhesive purge dam for retaining purge gas around a weld zone includes a base configured to substantially obstruct an air passage leading to the weld zone and an adhesive skirt extending from the base and configured to engage portions of the air passage. An adhesive on the adhesive skirt allows the skirt to be adhered to the air passage. An optional removable backing covers the adhesive prior to installation. The purge dam is installed by peeling the removable backing (if present) and exposing the adhesive for adhesion.
REFERENCES:
patent: 3736400 (1973-05-01), Spiegel et al.
patent: 4916281 (1990-04-01), Flasche et al.
patent: 5187343 (1993-02-01), Edwards
patent: 5390846 (1995-02-01), Thode
patent: 5583305 (1996-12-01), Hirsch et al.
patent: 5669547 (1997-09-01), Spring
patent: 5785235 (1998-07-01), Beatty
patent: 2004/0022676 (2004-02-01), Hamilton et al.
patent: 2005/0072809 (2005-04-01), Pantelleria et al.
AB Paper Co., Shur-Purge, Jan. 1, 1997, 5 pages.
Intercon, Water-Soluble Purge Paper, Oct. 1, 2002, 5 pages.
Gilbreth, Dissolvo, 2001, 8 pages.
Ahmad Nasser
Duft Walter W.
LandOfFree
Self-adhesive purge dam for retaining purge gas around a... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Self-adhesive purge dam for retaining purge gas around a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Self-adhesive purge dam for retaining purge gas around a... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3579203