Exposure apparatus and exposure method

Details Exposure apparatus and exposure method Exposure apparatus and exposure method

Filed on

2006-07-18

Date issued

2006-07-18

Examiner

Mathews, Alan (Department: 2851)

Patent Class

Photocopying

SubClass

Projection printing and copying cameras

SubSubClass

Step and repeat

Other Related Categories

C356S401000

Type

Reexamination Certificate

Status

active

Patent number

07079221

Description

ABSTRACT:
An exposure apparatus which projects a pattern of an original onto a substrate. The apparatus includes an original stage which supports the original, a substrate stage which supports the substrate, a reference pattern which is arranged on the original stage and to align the original stage and the substrate stage, and a mark, which is arranged on the original stage, has a known relative position from the reference pattern, and is to be projected onto the substrate to form an alignment mark on the substrate.

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patent: 5815594 (1998-09-01), Tanaka
patent: 6023320 (2000-02-01), Kawashima
patent: 2002/0154283 (2002-10-01), Tanaka et al.
patent: 2003/0053058 (2003-03-01), Tanaka
patent: 2003/0053059 (2003-03-01), Mishima et al.
patent: 2003/0174330 (2003-09-01), Tanaka et al.
patent: 2003/0235330 (2003-12-01), Tanaka
patent: 7-273018 (1995-10-01), None
patent: 9-275058 (1997-10-01), None
patent: 10-242043 (1998-09-01), None

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