Spin-on-glass anti-reflective coatings for photolithography

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From silicon reactant having at least one...

Reexamination Certificate

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C528S029000, C528S028000, C528S025000, C528S031000, C528S039000, C528S043000, C428S447000, C106S287110, C106S287130, C106S287140, C106S287160, C523S137000

Reexamination Certificate

active

07012125

ABSTRACT:
Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic dyes incorporated into spin-on-glass materials. Suitable dyes are strongly absorbing over wavelength ranges around wavelengths such as 248 nm and 193 nm that may be used in photolithography. A method of making dyed spin-on-glass materials includes combining one or more organic dyes with alkoxysilane reactants during synthesis of the spin-on-glass materials.

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