Method of manufacturing photomask

Details Method of manufacturing photomask Method of manufacturing photomask

2006-04-11

2006-04-11

Huff, Mark F. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C716S030000, C716S030000, C382S144000

Reexamination Certificate

active

07026078

ABSTRACT:
First, a correction is made for correcting the mask pattern configuration of a photomask (3) used for exposure in accordance with the space between a mask pattern and an adjacent mask pattern thereto and a desired configuration to be transferred from the mask pattern. Second, a correction is made for dividing the photomask (3) into a plurality of mesh regions (M) to correct the pattern configuration of the photomask (3) in accordance with the occupation rate (R) of the mask pattern in each of the mesh regions (M).

REFERENCES:
patent: 5948573 (1999-09-01), Takahashi
patent: 6137901 (2000-10-01), Harazaki
patent: 6335981 (2002-01-01), Harazaki
patent: 2002/0142233 (2002-10-01), Inoue
patent: 2003/0096177 (2003-05-01), Iwasaki

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