System and method for process matching

Data processing: structural design – modeling – simulation – and em – Simulating electronic device or electrical system – Software program

Reexamination Certificate

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C703S014000, C716S030000

Reexamination Certificate

active

06985847

ABSTRACT:
A computer-implemented method for matching parameters of outputs generated by a first and second process. The first process generates a first output having a characteristic measurable by a first parameter, and the second process generates a second output having the characteristic measurable by a second parameter. A computer having a processing unit and memory is provided. The computer generates a first model of the first parameter for the first process and a second model of the second parameter for the second process. The computer generates a first simulated output of the first process using the first model. A correction, which is a function of the second model and which compensates for the effect of the second process on the second parameter, is applied to the first simulated output to obtain a corrected output. The second process is applied to the corrected output to generate with the computer thereby a third output matching the first parameter of the first output.

REFERENCES:
patent: 5394322 (1995-02-01), Hansen
patent: 5783341 (1998-07-01), Uzawa
patent: 5814783 (1998-09-01), Harville et al.
patent: 5818583 (1998-10-01), Sevick-Muraca et al.
patent: 5825645 (1998-10-01), Konar et al.
patent: 5879845 (1999-03-01), Takahashi
patent: 5956495 (1999-09-01), Kahle et al.
patent: 6033814 (2000-03-01), Burdorf et al.
patent: 6085183 (2000-07-01), Horn et al.
patent: 6097433 (2000-08-01), Kawai et al.
patent: 6463403 (2002-10-01), Burdorf et al.
Bernard, D. Simulation of Focus Effects in Photolithography, IEEE Transactions on Semiconductor Manufacturing, vol. 1, No. 3, Aug. 1988, pp. 85-97.

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