Removable lid and floating pivot

Details Removable lid and floating pivot Removable lid and floating pivot

2006-07-11

2006-07-11

Lebentritt, Michael (Department: 2812)

Coating apparatus

Gas or vapor deposition

C220S819000, C438S014000

Reexamination Certificate

active

07074278

ABSTRACT:
A semiconductor processing system includes a chamber adapted to process a wafer, the chamber having an opening to facilitate access to the interior of the chamber. The system has a lid coupled to the chamber opening, the lid having an open position and a closed position. An actuator is connected to the lid to move the lid between the closed position and the open position. The system may include a floating pivot coupled to the lid and the actuator to align the lid with the opening when the lid closes.

REFERENCES:
patent: 6050446 (2000-04-01), Lei et al.
patent: 6145397 (2000-11-01), Nzeadibe
patent: 6395101 (2002-05-01), Scranton
patent: 6413355 (2002-07-01), Kamikawa et al.
patent: 6517634 (2003-02-01), Pang et al.
patent: 6609632 (2003-08-01), Nguyen et al.

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