Wafer refining

Abrading – Precision device or process - or with condition responsive... – Computer controlled

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C451S008000, C451S041000, C702S179000, C702S182000

Reexamination Certificate

active

06986698

ABSTRACT:
A method of in situ control for finishing semiconductor wafers to improve cost of ownership is discussed. A method to use business calculations combined with physical measurements to improve control is discussed. The use of lubricating layer control in the operative finishing interface is discussed. Use of business calculations to change the cost of finishing semiconductor wafers is discussed. The method aids control of differential lubricating films and improved differential finishing of semiconductor wafers. The method aids cost of manufacture forecasting. The method can help manage and/or reduce cost of manufacture for pre-ramp-up, ramp-up, and commercial manufacture of the workpieces. The method can aid cost of manufacture forecasting for pre-ramp-up, ramp-up, and commercial manufacture of the workpieces. The method can aid process control for pre-ramp-up, ramp-up, and commercial manufacture of workpieces. Activity based accounting can be preferred for some applications. Planarization and localized finishing can be improved using differential lubricating films for finishing. New methods and new apparatus for finishing control are disclosed.

REFERENCES:
patent: 4421068 (1983-12-01), Aral
patent: 4544375 (1985-10-01), Rehmat et al.
patent: 5023045 (1991-06-01), Watnabe et al.
patent: 5486995 (1996-01-01), Krist et al.
patent: 5521814 (1996-05-01), Teran et al.
patent: 5537325 (1996-07-01), Iwakiri
patent: 5609511 (1997-03-01), Moriyama
patent: 5647952 (1997-07-01), Chen
patent: 5667629 (1997-09-01), Pan
patent: 5682309 (1997-10-01), Bartusiak et al.
patent: 5691895 (1997-11-01), Kurtzberg et al.
patent: 5695660 (1997-12-01), Litvak
patent: 5740033 (1998-04-01), Wassick et al.
patent: 5774633 (1998-06-01), Baba et al.
patent: 5799286 (1998-08-01), Morgan et al.
patent: 5954997 (1999-09-01), Kaufman
patent: 5972793 (1999-10-01), Tseng
patent: 5987398 (1999-11-01), Halverson et al.
patent: 6038540 (2000-03-01), Krist et al.
patent: 6056781 (2000-05-01), Wassick et al.
patent: 6110214 (2000-08-01), Klimasauskas
patent: 6128540 (2000-10-01), Van Der Vegt et al.
patent: 6157916 (2000-12-01), Hoffman
patent: 6197604 (2001-03-01), Miller et al.
patent: 6246972 (2001-06-01), Klimasauskass
patent: 6263255 (2001-07-01), Tan et al.
patent: 6268641 (2001-07-01), Yano et al.
patent: 6298470 (2001-08-01), Breiner et al.
patent: 6408227 (2002-06-01), Singhvi et al.
patent: 6526547 (2003-02-01), Breiner et al.
patent: 6567718 (2003-05-01), Campbell et al.
patent: 6568989 (2003-05-01), Molnar
patent: 6796883 (2004-09-01), Molnar
patent: 2002/0010563 (2002-01-01), Ratteree et al.
patent: 2002/0123818 (2002-09-01), Yamada et al.
patent: 2002/0199082 (2002-12-01), Shanmugasundram et al.
patent: 2003/0046130 (2003-03-01), Golightly et al.
patent: 2003/0061004 (2003-03-01), Discenzo
patent: 2003/0083757 (2003-05-01), Card et al.
patent: 2003/0093762 (2003-05-01), Reitman et al.
Bibby, Thomas, “Endpoint Detection for CMP”, Journal of Electronic Materials, vol. 27, #10, 1998, pp. 1073-1081.
Berman, Mike et al., “Review of in Situ and in Line Detection for CMP Applic.”, Semiconductor Fabtech, 8thedition, pp. 267-274.
“Understanding and Using Cost of Ownership”, Wright Williams & Kelly, Dublin, CA, rev 0595-1.
“Intermetal Dielectric Cost-of-Ownership”, Case, C.B. and Case, C. J.,Semiconductor International, Jun. 1995, pp 83-88.
“Using COO to select Nitride PECVD clean cycle”, Anderson, Bob, et al., Semiconductor International, Oct. 1993, pp 86-88.
“The application of cost of ownership simulation to wafer sort and final test”, Jimez, D. W. et al., SEMI's Manufacturing test Conference, Jul., 1993.
“Reducing Tungsten Deposition equipment cost of ownership through in situ contamination prevention and reduction”, Burghard, R. W., et al.,Microcontamination,Oct. 1992, pp 23-25.
“Reducing ion-implant equipment cost of ownship through in situ contamination prevention and control”, Burghard., R. W., et al.,Microcontamination,Sep. 1992, pp 27-30.
“Reducing tungsten-etch equipment cost of ownership through in situcontamination prevention and reduction”, Burghard, R. W., et al.,Microcontamination, Jun. 1992, pp 33-36.
“Reducing process equipment cost of ownership through in situ contamination prevention and reduction”, Burghard, R. W., et al.,Microcontamination, May. 1992, pp 21-24.
“Cost of ownership for inspection equipment”, Dance D. and Bryson, P., Sematech, Austin, Texas, date unknown.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Wafer refining does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Wafer refining, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Wafer refining will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3547858

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.