Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2006-05-30
2006-05-30
McPherson, John A. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C716S030000, C378S034000, C378S035000
Reexamination Certificate
active
07052808
ABSTRACT:
An apparatus, system and method to compensate for the proximity effects in the imaging of patterns in a photolithography process. A light exposure of a photoresist layer is effectuated in predetermined patterns through an exposure mask having light-transmissive openings in correspondence to the predetermined patterns. The exposure mask has areas densely populated with the light-transmissive openings and areas sparsely populated with the light-transmissive openings. Light is attenuated through the densely populated light-transmissive openings by a different amount than through the sparsely populated light-transmissive openings.
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Kachwala, Nishrin; High Transmission attenuated PSM as a Viable Optical Extension Technique; Sep. 2001; Proc. SPIE vol. 4346, Optical Microlithography XlV, Christopher J. Progler: Ed., Abstract, pp. 807 and 811 only.
Lin Benjamin Szu-Min
Liu Hang Yip
Schmidt Sebastian
Chacko-Davis Daborah
Infineon - Technologies AG
McPherson John A.
United Microelectronics Co.
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