Lithographic apparatus and device manufacturing method

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control

Reexamination Certificate

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Details

C355S053000

Reexamination Certificate

active

07072021

ABSTRACT:
A lithographic apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and a first support for supporting a patterning device that serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and at least one gas generator for generating a conditioned gas flow. The gas generator includes a guiding element for guiding the gas flow to a lower volume generally located below a lower surface of the projection system and to a volume between the lower surface and the substrate. The guiding element directs the gas flow in a generally downward direction and then in a direction generally parallel to the lower surface.

REFERENCES:
patent: 6665046 (2003-12-01), Nogawa et al.
patent: 6721031 (2004-04-01), Hasegawa et al.
patent: 6721032 (2004-04-01), Hasegawa et al.
patent: 6867844 (2005-03-01), Vogel et al.
patent: 6970228 (2005-11-01), Aoki et al.
patent: 2002/0018190 (2002-02-01), Nogawa et al.
patent: 2002/0191163 (2002-12-01), Hasegawa et al.
patent: 2004/0156026 (2004-08-01), Kamiya
patent: 1 229 573 (2002-08-01), None
patent: WO 02/054460 (2002-07-01), None
European Search Report issued for European Patent Application No. 05076148.5, dated Aug. 12, 2005.

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