Lithographic apparatus and device manufacturing method

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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Details

C356S399000

Reexamination Certificate

active

07110083

ABSTRACT:
A lithographic projection apparatus is disclosed. The apparatus includes an illumination system for providing a beam of radiation used to irradiate a patterning device, and a first support that supports the patterning device. The patterning device capable of patterning the beam of radiation. The apparatus also includes a second support that supports a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a projection system positioning module that controls at least one of a position and an orientation of the projection system based on at least one of a velocity and an acceleration of the projection system.

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Jan Holterman, Theo J.A. De Vries, “Active damping within an advanced microlithography system using piezoelectric Smart Discs,” Mechatronics, Elsevier Ltd., No. 14, p. 15-34, (2003).
International Search Report dated Apr. 5, 2005.

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