Photocopying – Projection printing and copying cameras – Step and repeat
Reexamination Certificate
2006-04-18
2006-04-18
Kim, Peter B. (Department: 2851)
Photocopying
Projection printing and copying cameras
Step and repeat
C355S077000, C430S005000
Reexamination Certificate
active
07030962
ABSTRACT:
A projection exposure apparatus includes a projection exposure mask. The projection exposure mask includes a first mask pattern for exposing a member to form a continuous pattern thereon and a second mask pattern for exposing the member to form a discontinuous pattern thereon, one of the first and second mask patterns being a reflecting type mask and the other mask pattern being a transmitting type mask pattern, a projection system which projects light from the reflecting type mask pattern and light from the transmitting type mask pattern onto the member, a first illumination system which irradiates light to the reflecting type mask pattern from one side of the projection exposure mask, a second illumination system which irradiates light to the transmitting type mask pattern from the opposite side of the one side of the projection exposure mask, and a substrate stage which moves the member in a direction substantially orthogonal to a projection light axis of the projection system.
REFERENCES:
patent: 4708466 (1987-11-01), Isohata et al.
patent: 4878086 (1989-10-01), Isohata et al.
patent: 4998134 (1991-03-01), Isohata et al.
patent: 5359389 (1994-10-01), Isohata
patent: 5661744 (1997-08-01), Murakami et al.
patent: 6288772 (2001-09-01), Shinozaki et al.
patent: 6359678 (2002-03-01), Ota
patent: 6368756 (2002-04-01), Yamada et al.
patent: 2002/0187440 (2002-12-01), Kochi et al.
patent: 2004/0207784 (2004-10-01), Lim et al.
patent: 0 986 094 (2000-03-01), None
patent: 11-219900 (1999-08-01), None
patent: 2000-91221 (2000-03-01), None
European Search Report dated Sep. 22, 2005, issued in corresponding European patent application No. EP 04 00 1974, forwarded in a Communication dated Sep. 29, 2005.
Iizuka Kazuo
Isohata Junji
Tanaka Nobuyoshi
Canon Kabushiki Kaisha
Fitzpatrick ,Cella, Harper & Scinto
Kim Peter B.
LandOfFree
Projection exposure mask, projection exposure apparatus, and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Projection exposure mask, projection exposure apparatus, and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection exposure mask, projection exposure apparatus, and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3532801