Copper-based paste containing refractory metal additions for den

Electricity: conductors and insulators – Conduits – cables or conductors – Preformed panel circuit arrangement

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H05K 109

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active

055257615

ABSTRACT:
A copper-based paste for multilayer ceramic substrate vias and lines including copper particles as the majority constituent of the paste, a refractory metal additive selected from the group consisting of chromium, tantalum, and tungsten, and organic materials.
This copper-based paste has particular applicability to the formation of vias and lines in ceramic packages wherein the vias and lines would have a composition principally of copper with additions of the refractory metal.

REFERENCES:
patent: 3342587 (1967-09-01), Goodrich et al.
patent: 3549412 (1970-12-01), Frey, Jr. et al.
patent: 3831270 (1974-08-01), Huddleston
patent: 4020206 (1977-04-01), Beil
patent: 4234367 (1980-11-01), Herron et al.
patent: 4301324 (1981-11-01), Kumar et al.
patent: 4599277 (1986-07-01), Brownlow et al.
patent: 4606941 (1986-08-01), Jenkin
patent: 4671928 (1987-06-01), Herron et al.
patent: 4713494 (1987-12-01), Olkawa et al.
patent: 4776978 (1988-10-01), Herron et al.
patent: 4849284 (1989-07-01), Arthur et al.
patent: 5172301 (1992-12-01), Schneider
patent: 5229549 (1993-07-01), Yamakawa et al.

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