Method and device for evaluating charge potential

Details Method and device for evaluating charge potential Method and device for evaluating charge potential

2006-04-18

2006-04-18

Deb, Anjan (Department: 2858)

Electricity: measuring and testing

Impedance, admittance or other quantities representative of...

Lumped type parameters

Reexamination Certificate

active

07030628

ABSTRACT:
In a charge potential evaluation device, the measured value of a potential difference Vcin a charged plate monitor (CPM) is converted into a potential difference Vhbetween the conductive pattern and load beam in a head gimbal assembly (HGA), using the following expression (1),Vh=dhɛh·ɛcdc⁢Vc[Expression⁢⁢1]where dhdenotes the distance between the conductive pattern and the load beam in the HGA, dcdenotes the distance between the conductive plate and a grounded surface in the CPM, εhdenotes the relative permittivity of an insulating foundation layer in the HGA, and εcdenotes the relative permittivity of the region between the conductive plate and the grounded surface in the CPM.

REFERENCES:
patent: 5262730 (1993-11-01), Smith et al.
patent: 2002-252072 (2002-09-01), None

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