Optical device with enhanced mechanical stability operating...

Details Optical device with enhanced mechanical stability operating... Optical device with enhanced mechanical stability operating...

2006-03-14

2006-03-14

Chang, Audrey (Department: 2872)

Optical: systems and elements

Light interference

Produced by coating or lamina

C359S350000, C359S582000, C359S586000

Reexamination Certificate

active

07012753

ABSTRACT:
An optical device reflecting a range of wavelengths comprised between 10 nm and 20 nm comprises alternate superposed first and second layers. The first layers are made of metal or metallic compound and the second layers are formed by an amorphous silicon compound chosen from a-Si—Hx, a-Si—CHx, a-Si—Cx, a-Si—OHx, a-Si—Fx, a-Si—FHx, a-Si—Nx, a-Si—NHx, x being comprised between 0.01 and 0.3. The use of second layers of amorphous silicon compound enables the mechanical stresses of the optical device to be stabilized up to at least 200° C. The optical device is preferably used as reflector for a lithography mask in the extreme ultraviolet (EUV).

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Kim et al. “Annealing Effects on a-SiC:H and a-SiC:H(F) Thin Films Deposited by PECVD at Room Temperature,” Thin Solid Films 261 (1995) 192-201.

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