Substrate processing apparatus

Details Substrate processing apparatus Substrate processing apparatus

2005-11-29

2005-11-29

Fuqua, Shawntina (Department: 3742)

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

C219S405000, C219S411000, C392S416000, C392S418000, C118S724000, C118S725000, C118S050100

Reexamination Certificate

active

06969829

ABSTRACT:
A substrate processing apparatus including lift pins for lifting the substrate capable of moving up and down, a heating plate with holes through which the lift pins protrude and sink to a surface facing the substrate, a lid placed above the heating plate capable of moving up and down, a first inert gas introducing mechanism introducing a first inert gas to the inside portion of the lid and a second inert gas introducing mechanism introducing a second inert gas onto the surface of the heating plate through the holes. With such configuration, the inert gas can be introduced to both sides, the front side and the rear side, of the substrate, and oxygen is prevented from being forced to come around to the surface of the substrate from the rear side thereof. As a result, oxidation of the substrate can be prevented effectively.

REFERENCES:
patent: 4693211 (1987-09-01), Ogami et al.
patent: 6190459 (2001-02-01), Takeshita et al.
patent: 6246030 (2001-06-01), Matsuyama
patent: 6419751 (2002-07-01), Nagashima
patent: 6461439 (2002-10-01), Granneman et al.

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