Method of manufacturing electron-emitting device using...

Metal working – Method of mechanical manufacture – Electrical device making

Reexamination Certificate

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Details

C427S096100, C427S229000, C427S295000, C427S422000, C427S427000, C427S126100, C118S050100, C118S720000, C118S724000

Reexamination Certificate

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06901659

ABSTRACT:
An electron-emitting device manufacturing method comprising a gas removal step of removing a gas dissolved in a liquid containing a formation material of an electroconductive film in which an electron emitting area is to be formed, a temperature adjusting step of adjusting a temperature of the liquid from which the gas is removed, and a droplet discharge step of discharging droplets of which the temperature is adjusted by droplet discharge means in an ink jet manner, while controlling relative positions of the droplet discharge means and a substrate on which the electroconductive film in which the electron-emitting area is to be formed is formed. The droplets are thereby applied to a predetermined position on the substrate.

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Zoler et al, “A New Electrothermal-Chemical Method for Metals Carbides and Ceramics Hard Coating: Experiment and Theory” IEEE International Conference on Plasma Science, ICOPS'99, 1999, p. 211.

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