Sulfonium salt compound

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Compositions to be polymerized by wave energy wherein said...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C522S031000, C522S057000, C522S150000, C522S160000, C522S113000, C430S270100, C430S281100, C430S170000

Reexamination Certificate

active

06924323

ABSTRACT:
A compound shown by the general formula [1](wherein R1, R2and R3are each independently an aromatic hydrocarbon residual group, Yn−is an anion derived from a carboxylic acid having 3 or more carbon atoms with substituted fluorine atoms, and n is 1 or 2, provided that R1, R2and R3each is not a phenyl group having substituents at an ortho and/or a meta position), and a composition consisting of the compound and a diazodisulfone compound are disclosed. Use of the compound or the compound as an acid generator for resists produces the effects of improving the profiles of ultra-fine patterns or diminishing sidewall irregularities in ultra-fine patterns. The compound is also useful as a cationic photopolymerization initiator.

REFERENCES:
patent: 5238781 (1993-08-01), Schadeli
patent: 5369200 (1994-11-01), Schadeli et al.
patent: 5424166 (1995-06-01), Pawlowski et al.
patent: 5770343 (1998-06-01), Sato et al.
patent: 5962180 (1999-10-01), Iwanaga et al.
patent: 6143460 (2000-11-01), Kobayashi et al.
patent: 6485883 (2002-11-01), Kodama et al.
patent: 6492091 (2002-12-01), Kodama et al.
patent: 6602646 (2003-08-01), Sato et al.
patent: 6673512 (2004-01-01), Uenishi et al.
patent: 6692883 (2004-02-01), Nishiyama et al.
patent: 6727036 (2004-04-01), Kanna et al.
patent: 0 704 762 (1996-04-01), None
patent: 1 113 005 (2001-07-01), None
Derwent WPI—English abstract of JP 51-56885 A, dated May 18, 1976.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Sulfonium salt compound does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Sulfonium salt compound, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sulfonium salt compound will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3511632

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.