Pattern transfer method utilizing distribution condition evaluat

Details Pattern transfer method utilizing distribution condition evaluat Pattern transfer method utilizing distribution condition evaluat

1996-07-01

1998-08-25

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430296, 430942, 2504923, G03F 720

Patent

active

057981965

ABSTRACT:
A pattern transfer method in which a part or all of a plurality of small areas on a mask are sequentially irradiated with a charged particle beam to transfer an image of a pattern provided in each of the irradiated small areas onto a radiation-sensitive substrate, e.g., a wafer. A pattern distribution condition is evaluated for each small area, and an image-formation condition of the pattern image with respect to the radiation-sensitive substrate is adjusted for each small area on the basis of predetermined information including a result of the evaluation.

REFERENCES:
patent: 5208124 (1993-05-01), Sporon-Fiedler et al.
patent: 5254438 (1993-10-01), Owen et al.
patent: 5432714 (1995-07-01), Chung et al.
patent: 5667923 (1997-09-01), Kanata

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