Positive-working radiation-sensitive mixture

Details Positive-working radiation-sensitive mixture Positive-working radiation-sensitive mixture

1994-02-15

1996-06-11

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430191, 4302701, 4302711, G03F 7021

Patent

active

055254535

ABSTRACT:
A novel positive-working radiation-sensitive mixture having a high sensitivity to radiation in a short-wavelength UV region is provided which can be developed in an aqueous alkaline solution, has a stable acid latent image and is used for the production of a semiconductor. The mixture comprises, as indispensable components, a) a binder insoluble in water but soluble in an aqueous alkaline solution, b) a compound having at least one bond cleavable with an acid, c) a compound capable of producing an acid upon radiation, and d.sub.1) a basic ammonium compound or d.sub.2) a basic sulfonium compound.

REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.

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