Etching a substrate: processes – Forming or treating optical article
Reexamination Certificate
2005-08-09
2005-08-09
Olsen, Allan (Department: 1763)
Etching a substrate: processes
Forming or treating optical article
C216S041000, C216S067000, C216S080000
Reexamination Certificate
active
06926841
ABSTRACT:
An improved stepped etalon comprises a transparent body having a stepped surface. The lands of the steps are separated by a non-abrupt or softened transition region. This reduces the diffraction of light caused by the step transitions, thereby reducing the dead spot behind the step transition portions where interference prevents accurate measurements of light transmission from being made. Methods for producing a smoothly stepped etalon and for smoothing the step transitions in an abruptly stepped etalon are also disclosed.
REFERENCES:
patent: 5160993 (1992-11-01), Ishikawa et al.
patent: 5289314 (1994-02-01), Siebert
patent: 5293548 (1994-03-01), Siebert
patent: 5784507 (1998-07-01), Holm-Kennedy et al.
patent: 6015976 (2000-01-01), Hatakeyama et al.
L.N. Hadley and D.M. Dennison, “Reflection and Transission Interference Filters”,Journal of the Optical Society of America, vol. 37, Nos. 1-12, 1947, pp. 451-465.
A.F. Turner and O.A. Ullrich, “Continuously Variable Interference Filters,”Journal of the Optical Society of America, vol. 38, Nos. 1-12, 1948, p. 662.
Agere Systems Inc.
Olsen Allan
LandOfFree
Stepped etalon does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Stepped etalon, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Stepped etalon will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3503046