Stepped etalon

Etching a substrate: processes – Forming or treating optical article

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C216S041000, C216S067000, C216S080000

Reexamination Certificate

active

06926841

ABSTRACT:
An improved stepped etalon comprises a transparent body having a stepped surface. The lands of the steps are separated by a non-abrupt or softened transition region. This reduces the diffraction of light caused by the step transitions, thereby reducing the dead spot behind the step transition portions where interference prevents accurate measurements of light transmission from being made. Methods for producing a smoothly stepped etalon and for smoothing the step transitions in an abruptly stepped etalon are also disclosed.

REFERENCES:
patent: 5160993 (1992-11-01), Ishikawa et al.
patent: 5289314 (1994-02-01), Siebert
patent: 5293548 (1994-03-01), Siebert
patent: 5784507 (1998-07-01), Holm-Kennedy et al.
patent: 6015976 (2000-01-01), Hatakeyama et al.
L.N. Hadley and D.M. Dennison, “Reflection and Transission Interference Filters”,Journal of the Optical Society of America, vol. 37, Nos. 1-12, 1947, pp. 451-465.
A.F. Turner and O.A. Ullrich, “Continuously Variable Interference Filters,”Journal of the Optical Society of America, vol. 38, Nos. 1-12, 1948, p. 662.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Stepped etalon does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Stepped etalon, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Stepped etalon will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3503046

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.