Gated fabrication of nanostructure field emission cathode...

Semiconductor device manufacturing: process – Electron emitter manufacture

Reexamination Certificate

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C445S024000, C445S050000

Reexamination Certificate

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06858455

ABSTRACT:
Gated field emission devices and systems and methods for their fabrication are described. A method includes growing a substantially vertically aligned carbon nanostructure, the substantially vertically aligned carbon nanostructure coupled to a substrate; covering at least a portion of the substantially vertically aligned carbon nanostructure with a dielectric; forming a gate, the gate coupled to the dielectric; and releasing the substantially vertically aligned carbon nanostructure by forming an aperture in the gate and removing a portion of the dielectric.

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