Epitaxial oxide films via nitride conversion

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With decomposition of a precursor

Reexamination Certificate

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C117S088000, C117S095000, C117S102000, C117S106000, C117S944000

Reexamination Certificate

active

06852160

ABSTRACT:
The present invention relates to oxides on suitable substrates, as converted from nitride precursors.

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