Electron optical system, charged-particle beam exposure...

Details Electron optical system, charged-particle beam exposure... Electron optical system, charged-particle beam exposure...

2005-06-07

2005-06-07

Lee, John R. (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

C250S3960ML, C250S492100, C250S492200, C250S492210, C250S492220, C250S398000

Reexamination Certificate

active

06903345

ABSTRACT:
An electron optical system has a plurality of electron lenses. The system includes a first electron optical system array having electrodes with a plurality of rectangular apertures, and a second electron optical system array having electrodes with a plurality of rectangular apertures. The first and second electron optical system arrays are arranged along an optical axis in which a long side of each aperture of the first electron optical system array is perpendicular to a long side of each aperture of the second electron optical system array.

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