Photomask and method for manufacturing the photomask

Details Photomask and method for manufacturing the photomask Photomask and method for manufacturing the photomask

2005-06-28

2005-06-28

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

06911284

ABSTRACT:
A photomask for the manufacture of integrated semiconductor products has at least one first region with principal structures that correspond to structures on the integrated semiconductor structure to be manufactured and has at least one second region differing from the first region and having calibration structures which comprise at least two different, pre-defined expanses. The calibration structures contain pre-programmed flaws with predetermined sizes that are positioned on the photomask so that they do not negatively influence the functionality of the photomask. These calibration structures are then co-measured in a normal inspection, and the measured results can be subsequently normed to the detection of the calibration structures.

REFERENCES:
patent: 5691812 (1997-11-01), Bates et al.
patent: 6411378 (2002-06-01), Pike
patent: 2002/0082789 (2002-06-01), Takizawa et al.
patent: 2003/0194820 (2003-10-01), Jakatdar et al.

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