Method of manufacturing a thin film magnetic head

Details Method of manufacturing a thin film magnetic head Method of manufacturing a thin film magnetic head

2005-02-15

2005-02-15

Tugbang, A. Dexter (Department: 3729)

Metal working

Method of mechanical manufacture

Electrical device making

C029S603120, C029S603130, C029S603180, C216S022000, C216S064000, C216S067000, C204S192340, C204S192350, C360S119050, C360S125020

Reexamination Certificate

active

06854175

ABSTRACT:
A method of manufacturing a thin film magnetic head capable of improving a yield while making a pole width extremely minute with high precision is provided. A write gap layer and a bottom pole are selectively etched in a region other than a portion corresponding to a front end part through the RIE with the front end part having an extremely minute uniform width as a mask in an atmosphere of gas including at least chlorine out of chlorine and boron trichloride and at an ambient temperature within a range of 30° C. to 300° C. The width (pole width) of a pole portion can be made uniform with high precision along a length direction so that the yield of the thin film magnetic head can be improved.

REFERENCES:
patent: 4208241 (1980-06-01), Harshbarger et al.
patent: 4267013 (1981-05-01), Iida et al.
patent: 6047462 (2000-04-01), Miyauchi et al.
patent: 6591480 (2003-07-01), Chen et al.
patent: 62-285406 (1987-12-01), None

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