Method for inspecting defects and an apparatus for the same

Details Method for inspecting defects and an apparatus for the same Method for inspecting defects and an apparatus for the same

2005-02-01

2005-02-01

Smith, Zandra V. (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S237400, C382S149000

Reexamination Certificate

active

06850320

ABSTRACT:
The present invention provides a highly sensitive inspection technology that prevents false detections. The present invention includes means for detecting an image of an entire chip. Using this image, inspection regions are defined based on criticality. Detection sensitivities can be set for each of these inspection sensitivities. Alternatively, false detections can be eliminated in post-inspection processing by recording characteristic values used to evaluate defects, e.g., concentration differences, in the inspection results. Furthermore, by providing a system that allows sharing of inspection conditions and the like needed by multiple inspection devices, the time required for determining inspection conditions can be shortened and stability and reliability can be monitored.

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