Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2005-11-01
2005-11-01
Berman, Jack I. (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C378S034000
Reexamination Certificate
active
06960773
ABSTRACT:
A maskless lithography system is disclosed that includes an array of blazed diffractive zone plates, each of which focuses an energy beam into an array of images in order to create a permanent pattern on an adjacent substrate in certain embodiments. In further embodiments, an array of apodized diffractive elements may also be used.
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Barbastathis George
Carter David
Gil Dario
Menon Rajesh
Smith Henry I.
Berman Jack I.
Gauthier & Connors LLP
Massachusetts Institute of Technology
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