System and method for maskless lithography using an array of...

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Reexamination Certificate

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C378S034000

Reexamination Certificate

active

06960773

ABSTRACT:
A maskless lithography system is disclosed that includes an array of blazed diffractive zone plates, each of which focuses an energy beam into an array of images in order to create a permanent pattern on an adjacent substrate in certain embodiments. In further embodiments, an array of apodized diffractive elements may also be used.

REFERENCES:
patent: 5071207 (1991-12-01), Ceglio et al.
patent: 5078513 (1992-01-01), Spaulding et al.
patent: 5159586 (1992-10-01), Yamashita et al.
patent: 5245619 (1993-09-01), Kronberg
patent: 5257132 (1993-10-01), Ceglio et al.
patent: 5262893 (1993-11-01), Shrauger et al.
patent: 5263073 (1993-11-01), Feldman
patent: 5822119 (1998-10-01), Rasmussen et al.
patent: 5900637 (1999-05-01), Smith
patent: 6046859 (2000-04-01), Raj
patent: 6133986 (2000-10-01), Johnson
patent: 6330118 (2001-12-01), Daschner et al.
patent: 2003/0123040 (2003-07-01), Almogy
“Sharper images by focusing soft X-rays with photon sieves,” Kipp et al.Nature. Nov. 2001. vol. 414.
“Zone plate for arbitrarily high focal depth,” Ojeda-Castaneda et al.Applied Optics. Mar. 1990. vol. 29, No. 7.
Gil et al., “Lithographic patterning and confocal imaging with zone plates,”J. Vac. Sci. Technol. B, vol. 8(6), (Nov./Dec. 2000): 2881-2885.
Eisner et al., “Confocal microscopy with a refractive microlens- pinhole array,”Optics Letters, vol. 23(10), (May 15, 1998), 748-749.
Ahn, S.H. and Y.K. Kim, “Proposal of human eye's crystalline lens-like variable focusing lens,”Broadband Optical Networks and Technologies: An Emerging Reality/ Optical MEMS/ Smart Pixels/ Organic Optics and Optoelectronics. 1998 IEEE, :II/89-II/90.
Kipp et al., “Sharper images by focusing soft X-rays with photon sieves,”Nature, vol. 414, (Nov. 8, 2001): 184-188.
Hoshino, K. and I. Shimoyama, “An Elastic Thin-Film Microlens Array With a Pneumatic Actuator,”Micro Electro Mechanical Systems, 2001. MEMS 2, 321-324.

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