Plasma chamber cleaning

Details Plasma chamber cleaning Plasma chamber cleaning

2005-02-15

2005-02-15

Kornakov, M. (Department: 1746)

Cleaning and liquid contact with solids

Processes

Combined

C134S001100, C134S022100, C134S902000, C438S905000

Reexamination Certificate

active

06855209

ABSTRACT:
A method for determining optimum plasma chamber cleaning cycles based on an electrical precursor signal. Polymer build up on the interior wall of plasma chamber1during normal production runs is monitored by observing the phase of the fundamental RF signal on a pre-selected baseline process. At a predetermined level of this signal, the chamber processing is stopped and the chamber walls are cleaned.

REFERENCES:
patent: 5458732 (1995-10-01), Butler et al.
patent: 6051284 (2000-04-01), Byrne et al.
patent: 6305390 (2001-10-01), Jeon
patent: 6503410 (2003-01-01), Blalock et al.
patent: 6564810 (2003-05-01), Raaijmakers et al.
patent: 20010008138 (2001-07-01), Demos et al.

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