Method for inspecting defects on a mask

Details Method for inspecting defects on a mask Method for inspecting defects on a mask

2005-11-29

2005-11-29

Bali, Vikkram (Department: 2623)

Image analysis

Applications

Manufacturing or product inspection

C382S145000

Reexamination Certificate

active

06970589

ABSTRACT:
The whole-area defect inspection of masks is made possible by interconnecting two otherwise independent defect inspection systems via a powerful bus system or interface. As a result, two masks that are identical, at least in sub-areas, can be inspected and compared in parallel and in real time. It is not necessary to temporarily store large quantities of data. The running defect inspection can be interrupted flexibly and continued again. This implementation of mask-to-mask inspection takes into account that simulation algorithms for die-to-database inspection of future mask technology, for example, alternating phase masks, EUV masks, stencil masks, and so on are not available in good time. In addition, the inspection time is reduced considerably.

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