Method and apparatus for making devices

Details Method and apparatus for making devices Method and apparatus for making devices

2005-12-13

2005-12-13

Tugbang, A. Dexter (Department: 3729)

Metal working

Method of mechanical manufacture

Electrical device making

C029S729000, C029S745000, C029S852000, C029S890100, C216S013000, C216S024000, C270S001010, C343S895000, C343S741000, C347S063000, C347S064000, C347S065000, C438S149000, C438S490000, C438S502000, C438S669000

Reexamination Certificate

active

06973710

ABSTRACT:
A method and an apparatus for manufacturing a device are provided. The method and the apparatus can form micro wiring without undesired wetting and spreading using an inexpensive functional-liquid supplying method. A method for forming a device, such as a radiofrequency identification tag, includes: making patterns at a plurality of sections having different degrees of affinity to the functional liquid on a substrate to form the device; and supplying the functional liquid to the selected section having high affinity to the functional liquid. Forming the plurality of sections having different degrees of affinity to the functional liquid includes, for example: supplying an organosiloxane film on the substrate, and exposing the organosiloxane film through an optical mask.

REFERENCES:
patent: 6051508 (2000-04-01), Takase et al.
patent: 6063527 (2000-05-01), Nishikawa et al.
patent: 6518087 (2003-02-01), Furusawa et al.
patent: 6733868 (2004-05-01), Kanbe et al.
patent: 05167330 (1993-07-01), None
patent: A-7-326235 (1995-12-01), None
patent: A-9-69334 (1997-03-01), None
patent: A-9-131914 (1997-05-01), None
patent: A-9-260808 (1997-10-01), None
patent: A-11-204529 (1999-07-01), None
patent: A-2000-137873 (2000-05-01), None
patent: A-2002-98994 (2002-04-01), None
patent: A-2003-518755 (2003-06-01), None
patent: WO 01/47044 (2001-06-01), None
“Development of aperiodic instability on liquid metal surface perturbed by thermal fluctuations”; Baskin, L.M.; Electrical Insulation, IEEE Transactions; Dec. 1 1989; pp.:929-931.

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