Semiconductor device manufactured with auxillary mask and...

Details Semiconductor device manufactured with auxillary mask and... Semiconductor device manufactured with auxillary mask and...

2005-12-13

2005-12-13

Smith, Brad (Department: 2891)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S735000, C438S742000

Reexamination Certificate

active

06974778

ABSTRACT:
The invention provides a semiconductor device having less defectives in shape of a patterned wiring layer even in a case of having a wiring layer for which patterning is required to be carried out over a longer period of etching time, and a method for producing the same. By carrying out dry etching using a fluorine-based gas with a photoresist17aused as a mask, an auxiliary mask15ais formed by patterning the insulation membrane. Next, by carrying out dry etching using a chlorine-based gas using the auxiliary mask15aand the remaining photoresist17aas masks, wiring13ais formed by patterning the wiring layer13. In the second etching, the auxiliary mask15ais scarcely etched. Therefore, if the thickness of the photoresist17ais equivalent to that in the prior arts, it is possible to pattern a thicker wiring layer13than in the prior arts.

REFERENCES:
patent: 5596230 (1997-01-01), Hong
patent: 5668398 (1997-09-01), Havemann et al.
patent: 6140023 (2000-10-01), Levinson et al.
patent: 6358429 (2002-03-01), Koshido
patent: 02-094439 (1990-04-01), None
patent: 08-181146 (1996-07-01), None
patent: 11-274160 (1999-10-01), None
patent: 2000-091311 (2000-03-01), None
patent: 2000-235973 (2000-08-01), None
patent: 2001-057369 (2001-02-01), None
patent: 2001-196376 (2001-07-01), None

Affiliated with

Also associated with

Rating

Semiconductor device manufactured with auxillary mask and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device manufactured with auxillary mask and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device manufactured with auxillary mask and... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3465315