Spin-on-glass anti-reflective coatings for photolithography

Details Spin-on-glass anti-reflective coatings for photolithography Spin-on-glass anti-reflective coatings for photolithography

2005-10-18

2005-10-18

Moore, Margaret G. (Department: 1712)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From silicon reactant having at least one...

C528S039000, C528S041000, C528S043000, C528S021000, C106S287140, C428S447000, C523S137000

Reexamination Certificate

active

06956097

ABSTRACT:
Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.

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