Etching a substrate: processes – Forming or treating optical article
Reexamination Certificate
2005-06-21
2005-06-21
Ahmed, Shamim (Department: 1765)
Etching a substrate: processes
Forming or treating optical article
C216S032000, C216S067000, C216S077000, C438S712000, C204S192350
Reexamination Certificate
active
06908562
ABSTRACT:
A method of forming an electrode for a surface acoustic wave (SAW) device comprises the steps of forming an alloy film (32) made of aluminum (Al) and magnesium (Mg) on a substrate (31) and selectively etching the alloy film (32) by using a gaseous mixture composed of BCl3, Cl2, and N2 to form the electrode such that the electrode has at least one sidewall polymer film (33). The method controls the production of hillocks and voids to provide high withstand voltage.
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patent: 6204190 (2001-03-01), Koshido
patent: 6526996 (2003-03-01), Chang et al.
Ahmed Shamim
Oki Electric Industry Co. Ltd.
Takeuchi & Takeuchi
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